As a postdoc you will develop a lensless extreme ultraviolet (EUV) imaging system using a high-harmonic generation (HHG) source, perform imaging experiments on semiconductor nanostructures, and develop new concepts for spectrally resolved coherent diffractive imaging and ptychography with HHG sources.
Research / Job description
The ability to perform high-resolution imaging with EUV radiation provides exciting possibilities in science and technology. Especially for characterizing lithographic nanostructures with sub-20 nm feature size, EUV microscopy is a promising new tool. While lens-based imaging is challenging at EUV wavelengths, lensless imaging methods based on coherent diffraction form a versatile and powerful solution.
In this project we use coherent EUV radiation from a HHG source, combined with coherent imaging techniques such as ptychography, to perform high-resolution imaging on semiconductor nanostructures. As a postdoc, you will work on the developmet of methods that enable spectrally resolved imaging, as well as novel concepts for optimally efficient diffractive imaging with broadband HHG sources. The aim of your project is to enable element-sensitive high-resolution imaging of complex nanostructures.
You will perform this project together a team of PhD students and postdocs in the EUV Generation and Imaging group, and will have the opportunity to collaborate with researchers from the various other research groups at ARCNL. This project is part of the NWO-TTW-funded LINX (Lensless Imaging of Nanostructures with soft-X-rays) consortium, consisting of research groups from five Dutch universities and several industrial partners.
About the group
The Advanced Research Center for Nano-Lithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nano-lithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam in The Netherlands and currently houses approximately 90 scientists and support staff.
The EUV Generation and Imaging group at ARCNL focuses on the development and application of advanced imaging and laser technology, in particular lensless imaging with HHG sources, with the aim to visualize and study micro- and nanoscale structures with unprecedented detail and contrast. Furthermore, we explore routes towards optimization of extreme ultraviolet light production from laser-produced plasmas, using advanced optical methods and ultrafast laser technology.
You have a PhD-degree in Physics or Technical/Applied Physics (or a similar subject), with experience in ultrafast lasers, parametric amplifiers, high-harmonic generation, ptychography and coherent imaging, and/or experiments involving EUV radiation. Affinity for working with optical imaging, programming, and working as part of a team are considered important. Good verbal and written communication skills (in English) are required.
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the initial duration of 1 year, with the possibility of extension, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.
Dr. Stefan Witte
Group leader EUV Generation and Imaging
Phone: +31 (0)20-754 7100
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|Title||Postdoc project at ARCNL: Element-sensitive lensless EUV imaging and ptychography with high-harmonic generation sources|
|Employer||Advanced Research Center for Nanolithography ARCNL|
|Job location||Science Park 106, 1098 XG Amsterdam|
|Published||June 17, 2021|
|Application deadline||October 1, 2021|
|Job types||Postdoc  |
|Fields||Optics,   Applied Physics,   Laser Physics  |